Product Detail :
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Multitarget UHV sputtering system Multi target UHV Sputtering System System should consist of deposition chamber and load lock chamber with Ultra high vacuum. Sputtering chamber should be provided with 6 sputter cathodes of DC. Load lock chamber with a rf sputtering gun.
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Tender Detail : |
Multitarget UHV sputtering system #*. Multi target UHV Sputtering System System should consist of deposition chamber and load lock chamber with Ultra high vacuum. Sputtering chamber should be provided with 6 sputter cathodes of DC. Load lock chamber with a rf sputtering gun. |